DETERMINATION OF THE THICKNESS OF ULTRATHIN COATINGS BY X-RAY PHOTOELECTRON-SPECTROSCOPY WITH ELASTIC-SCATTERING OF PHOTOELECTRONS TAKEN INTO ACCOUNT

Authors
NEFEDOV VI NEFEDOVA IS ULIG I ZARULLA D SZARGAN R
Citation
Vi. Nefedov et al., DETERMINATION OF THE THICKNESS OF ULTRATHIN COATINGS BY X-RAY PHOTOELECTRON-SPECTROSCOPY WITH ELASTIC-SCATTERING OF PHOTOELECTRONS TAKEN INTO ACCOUNT, Inorganic materials, 34(11), 1998, pp. 1088-1091
Citations number
4
Categorie Soggetti
Material Science
Journal title
Inorganic materials → ACNP
ISSN journal
00201685
Volume
34
Issue
11
Year of publication
1998
Pages
1088 - 1091
Database
ISI
SICI code
0020-1685(1998)34:11<1088:DOTTOU>2.0.ZU;2-2
Abstract
A method based on x-ray photoelectron spectroscopy and taking into acc ount elastic scattering of photoelectrons was used to determine the th ickness of ultrathin Au films evaporated on SiO2. The results derived from the O Is, Si 2p, Au 4f, and Au 4f/Si 2p signals measured as a fun ction of escape angle are in close agreement. The thicknesses of the f ilms deposited over periods of 3, 6, and 9 min are in the ratio of abo ut I : 2 : 3. Neglect of elastic scattering would lead to thicknesses overestimated by 20-30%.