DETERMINATION OF OPTICAL-PROPERTIES VARIATION OF SILICON AND GLASS SURFACES AFTER MECHANICAL AND PLASMA TREATMENTS BY MONOCHROMATIC ELLIPSOMETRY

Determination of optical properties variation of silicon and glass sur faces after mechanical and plasma treatments by monochromatic ellipsom etry. The optical model of disrupted layer on solid surface can consis t of the natural oxide layer, the transition layer, and bulk material with the induced anisotropy. Four procedures for detection of disrupte d layers in cubic crystals and amorphous solids were tested using of m onochromatic ellipsometry. The solution of inverse problem, the search of the principal angle, the measurement of the off-diagonal elements of reflective matrix, the detection of the weak anisotropy by the cali bration of the azimuth scales of ellipsometer are proven.