A. Kawano et al., ELECTRON INJECTION EFFECT ON FORMATION AND DECOMPOSITION OF C-H COMPLEXES IN C-DOPED GAAS BASE OF H-IMPLANTED INGAP()GAAS HBTS/, Solid-state electronics, 42(11), 1998, pp. 2057-2061
We observed the current gain and turn-on voltage variations in H+-impl
anted InGaP/GaAs heterojunction bipolar transistors with carbon-doped
bases under high temperature current stresses. The variation occurs in
two stages: the first stage is characterized by a current gain increa
se and a turn-on voltage decrease, and the second by a current gain de
crease and a turn-on voltage increase. The first variation is attribut
ed to a decrease of the hole concentration in the base, caused by the
formation of C-H complexes in the base. The second Variation arises fr
om an increase of the hole concentration in the base, which is brought
about by a decomposition of the C-H complexes. Hydrogen in the base i
s diffused from the H+-implanted region predominantly during the HBT f
abrication process. Both the formation and the decomposition of C-H co
mplexes are assisted by current injection. The formation of C-H comple
xes may be enhanced by the energy transfer from 2 electrons. The decom
position of C-H complexes is dominated by the capturing of single elec
trons. After the variation, hydrogen do not cause ''essential'' degrad
ation. Consequently, the HBTs must be finally free from hydrogen. (C)
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