DETERMINATION OF THE ATOMIC NITROGEN FLUX FROM A RADIO-FREQUENCY PLASMA NITRIDE SOURCE FOR MOLECULAR-BEAM EPITAXY SYSTEMS

Authors
VOULOT D MCCULLOUGH RW THOMPSON WR BURNS D GEDDES J COSIMINI GJ NELSON E CHOW PP KLAASSEN J
Citation
D. Voulot et al., DETERMINATION OF THE ATOMIC NITROGEN FLUX FROM A RADIO-FREQUENCY PLASMA NITRIDE SOURCE FOR MOLECULAR-BEAM EPITAXY SYSTEMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(6), 1998, pp. 3434-3437
Citations number
7
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
16
Issue
6
Year of publication
1998
Pages
3434 - 3437
Database
ISI
SICI code
0734-2101(1998)16:6<3434:DOTANF>2.0.ZU;2-9
Abstract
Direct measurements of. both the dissociation fraction and the atom fl ux have been carried out for the first time to characterize a radio fr equency (rf) atomic nitrogen source. The measurements have been made o ver a range of Source pressures and rf powers. Dissociation fractions of up to 0.4 and atomic nitrogen fluxes of up to 0.85x 10(18) atom s(- 1) were obtained. In addition these results have been correlated with spectroscopic measurements of the ratios of atomic and molecular optic al emissions from the source plasma in order to provide a way of estim ating in situ the atomic flux. (C) 1998 American Vacuum Society. [S073 4-2101(98)04606-5].