SIMULATIONS OF TRENCH-FILLING PROFILES UNDER IONIZED MAGNETRON SPUTTER METAL-DEPOSITION

Authors
HAMAGUCHI S ROSSNAGEL SM
Citation
S. Hamaguchi et Sm. Rossnagel, SIMULATIONS OF TRENCH-FILLING PROFILES UNDER IONIZED MAGNETRON SPUTTER METAL-DEPOSITION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(2), 1995, pp. 183-191
Citations number
13
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
2
Year of publication
1995
Pages
183 - 191
Database
ISI
SICI code
1071-1023(1995)13:2<183:SOTPUI>2.0.ZU;2-#