INVESTIGATION OF SILICON TRANSPORT IN THE NEUTRAL BACKGROUND OF A PLASMA ACTIVATED REACTIVE EVAPORATION SYSTEM

Authors
HIGGINS B DURANDET A BOSWELL R
Citation
B. Higgins et al., INVESTIGATION OF SILICON TRANSPORT IN THE NEUTRAL BACKGROUND OF A PLASMA ACTIVATED REACTIVE EVAPORATION SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(2), 1995, pp. 192-197
Citations number
16
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
2
Year of publication
1995
Pages
192 - 197
Database
ISI
SICI code
1071-1023(1995)13:2<192:IOSTIT>2.0.ZU;2-C