Mt. Cuberes et al., BALLISTIC-ELECTRON-EMISSION MICROSCOPY ON THE AU N-SI(111)7X7 INTERFACE/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2422-2428
Ballistic-electron emission microscopy (BEEM), performed under ultrahi
gh vacuum conditions at the room-temperature-grown Au/n-Si(111)7X7 int
erface, allows a measurement of the BEEM current for tip biases up to
almost-equal-to 8 V without a noticeable change in ballistic transmiss
ivity. The differences of the present results to previous reports, whe
re either no BEEM current was observed or the transmissivity was modif
ied when applying high tip voltages, can be explained by the absence o
f intermixing at the Au/Si interface. Scanning tunneling microscope im
ages of almost-equal-to 40-angstrom-thick Au films reveal a characteri
stic topography of the metal surface with almost-equal-to 2.5 angstrom
high circular terraces stacked in up to four stages.