GROWTH OF HIGH-MOBILITY INSB CRYSTALS

Citation
Db. Gadkari et al., GROWTH OF HIGH-MOBILITY INSB CRYSTALS, Journal of crystal growth, 173(3-4), 1997, pp. 585-588
Citations number
9
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
173
Issue
3-4
Year of publication
1997
Pages
585 - 588
Database
ISI
SICI code
0022-0248(1997)173:3-4<585:GOHIC>2.0.ZU;2-D
Abstract
Experiments on the growth of high-mobility Te-doped n-type InSb and un doped p-type InSb crystals by vertical directional solidification are reported. Hall mobility of the Te-doped crystals is 26 000 cm(2)/V.s a nd of the undoped crystals 42 000 cm(2)/V.s at 300 K. The Hall coeffic ient of Te-doped samples is negative over the entire temperature range , but the Hall coefficient of the undoped samples is positive at low t emperature, and changes sign at higher temperatures.