REACTIVE-SPUTTERING OF TITANIUM-OXIDE THIN-FILMS

Titanium oxide thin films are useful for applications such as catalysi s, optical coatings, gas sensors, and other electronic devices. We hav e sputtered titanium in atmospheres of varying amounts of oxygen and a rgon; the resulting films were studied with x-ray photoelectron spectr oscopy and x-ray diffraction in order to determine the changes in chem ical composition. In addition, the thicknesses were measured for the p urpose of finding the film growth rate versus oxygen content. We found that the films were composed of combinations of metallic titanium and three oxides. Metallic titanium and stoichiometric titanium oxide coe xisted only in films grown with decreasing oxygen flow rates. Also, th e highest stoichiometric TiO2 content in high-deposition rate films wa s obtained in the region of decreasing oxygen flow. (C) 1997 American Vacuum Society.