Mg. Rao et C. Dong, EVALUATION OF LOW-COST RESIDUAL-GAS ANALYZERS FOR ULTRAHIGH-VACUUM APPLICATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1312-1318
Citations number
12
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
In recent years several low cost computer controlled residual gas anal
yzers (RGAs) have been introduced into the market place. It would be v
ery useful to know the performance characteristics of these RGAs in or
der to make an informed selection for UHV applications. The UHV applic
ations include extreme sensitivity helium leak detection and monitorin
g of the residual gas spectra in UHV systems. In this article, the sen
sitivity and linearity data for nitrogen, hydrogen, and helium are pre
sented in the pressure range 10(-8)-10(-1) Pa. Further, the relationsh
ips between focus voltage and ion currents, relative sensitivity, and
fragmentation factor are also included. A direct comparison method is
used in obtaining this data. Spinning rotor and extractor gauges are t
he transfer standard gauges used in Jefferson Lab's vacuum calibration
facility, with which all the reported measurements here were carried
out. (C) 1997 American Vacuum Society.