METAL PATTERN FABRICATION USING THE LOCAL ELECTRIC-FIELD OF A CONDUCTING ATOMIC-FORCE MICROSCOPE PROBE

Two approaches were developed using an ambient atomic force microscope (AFM) to pattern metal in either positive or negative tone. The diffe rence in surface chemical reactivity between exposed and unexposed reg ions was used to selectively attach colloidal Pd(II) nanoparticles cap able of initiating the deposition of electroless (EL) Ni. In one case, EL Ni was selectively deposited in the unexposed regions of an organo silane film. In the second case, EL Ni was selectively deposited direc tly on an AFM oxide pattern. Based on the different binding selectivit ies of the Pd(II) catalysts, selective deposition on AFM patterns was attributed to the presence of a carbon residue in AFM oxide patterns f ormed under ambient conditions. The patterned Ni films were used as a mask for pattern transfer into the underlying substrate by reactive io n etching. (C) 1997 American Vacuum Society.