FORMATION OF NH3 AND N-2 FROM ATOMIC NITROGEN AND HYDROGEN ON RHODIUM(111)

Citation
Rm. Vanhardeveld et al., FORMATION OF NH3 AND N-2 FROM ATOMIC NITROGEN AND HYDROGEN ON RHODIUM(111), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1558-1562
Citations number
21
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
15
Issue
3
Year of publication
1997
Part
2
Pages
1558 - 1562
Database
ISI
SICI code
0734-2101(1997)15:3<1558:FONANF>2.0.ZU;2-L
Abstract
Reactions of adsorbed N atoms on Rh(lll) to N-2 and NH3 were studied w ith temperature programmed desorption, temperature programmed reaction spectroscopy, and static secondary ion mass spectrometry. For N-atom coverages below approximate to 10.15 monolayers, desorption of N-2 fol lows simple second-order kinetics, but at higher coverages the desorpt ion traces broaden to higher temperatures. Hydrogenation to NH3 can be described by a stepwise addition of H atoms to N-ads in which the rea ction from NH2,ads+H-ads to NH3,ads determines the rate. The activatio n energy for the rate determining step is 76 kJ/mol. The desorption of NH3 from Rh(111) was studied separately. The kinetic parameters for d esorption at low NH3 coverage are 81 kJ/mol and 10(13) s(-1), but the rate of desorption increases rapidly with increasing NH3 coverage. It is argued that the remarkable coverage dependence of the desorption ra te is unlikely to be caused by lateral repulsive interactions but may be due to a coverage dependence of the pre-exponential factor. (C) 199 7 American Vacuum Society.