Lp. Zhang et al., EPITAXIAL-GROWTH OF ULTRATHIN FILMS OF CHROMIUM AND ITS OXIDES ON PT(111), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1576-1580
Citations number
34
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The growth of vapor-deposited Cr and chromium oxide on Pt(111) has bee
n studied by ion scattering spectroscopy, x-ray photoelectron spectros
copy, low energy electron diffraction, and scanning tunneling microsco
py. Both metal Cr film and its oxide nucleate at Pt(111) step edges, a
nd grow in a step-flow mode. The metal Cr film is pseudomorphic to the
Pt(111) substrate within the first two monolayers. At higher coverage
s, the chromium overlayer adopts a bcc(110) surface structure and form
s three-dimensional elongated islands oriented along the three close-p
acked directions of the Pt(111) surface. For the chromium oxide, a wel
l ordered p(2X2) structure is observed within the first two monolayers
and attributed to the epitaxial growth of metastable Cr3O4. At higher
coverages, a (root 3 X root 3)R30 degrees structure appears, due to t
he formation of the stable Cr2O3 phase. (C) 1997 American Vacuum Socie
ty.