DEPENDENCE OF CURRENT-VOLTAGE CHARACTERISTICS ON AL MOLE FRACTION IN GAAS ALXGA1-XAS ASYMMETRIC DOUBLE-BARRIER STRUCTURES/

Citation
Lj. Blue et al., DEPENDENCE OF CURRENT-VOLTAGE CHARACTERISTICS ON AL MOLE FRACTION IN GAAS ALXGA1-XAS ASYMMETRIC DOUBLE-BARRIER STRUCTURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 696-701
Citations number
31
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
15
Issue
3
Year of publication
1997
Pages
696 - 701
Database
ISI
SICI code
1071-1023(1997)15:3<696:DOCCOA>2.0.ZU;2-6
Abstract
The effect of barrier Al mole fraction, 0.2 less than or equal to x le ss than or equal to 0.8, on tunneling currents has been studied for a set of asymmetric GaAs/AlxGa1-xAs double barrier structures. The barri er widths of each sample were scaled so that barrier transmission coef ficients for different samples should be approximately equivalent at t he first resonant tunneling peak. Structures were grown by molecular b eam epitaxy; by adjusting Ga and Al cell temperatures, the full range of Al mole fractions could be achieved in AlxGa1-xAs barrier layers wh ile maintaining a nearly constant growth rate of about 1 mu m/h. Curre nt-voltage measurements are in agreement with theoretical estimates an d indicate good sample quality. (C) 1997 American Vacuum Society.