C. Ohler et al., BARRIER HEIGHT AT CLEAN AU INAS(100) INTERFACES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 702-706
Using photoelectron spectroscopy, we have reexamined the barrier heigh
t at Au/InAs(100) contacts prepared under ultrahigh vacuum conditions.
The n-barrier height is 0.010 +/- 0.050 eV: the Fermi level at the in
terface is right at the InAs conduction band edge. This result is expe
cted from models based on charge transfer into metal-induced gap state
s but contrasts with previously published experimental values. Dependi
ng on the preparation procedure, the surface of InAs(100) grown using
molecular-beam epitaxy shows c(4x4) or (2x4) reconstruction; the barri
er height, however, is independent of the surface reconstruction prior
to gold deposition. (C) 1997 American Vacuum Society.