Bl. Williams et al., X-RAY ROCKING CURVE ANALYSIS OF ION-IMPLANTED MERCURY CADMIUM TELLURIDE, Journal of electronic materials, 26(6), 1997, pp. 600-605
Junction formation by ion implantation is a critical step in producing
high quality infrared focal plane arrays in mercury cadmium telluride
(MCT). We have analyzed the structural properties of MCT implanted wi
th B at doses of 10(14) and 10(15) cm(-2) using double and triple crys
tal x-ray diffraction (DCD and TCD) to monitor the disorder aad strain
of the implanted. region as a function of processing conditions. TCD
(333) reflections show that a distinct tensile peak is produced by the
high dose implant while the low dose implant shows only a low angle s
houlder on the substrate peak. A preliminary association of the low an
gle shoulder with point defects has been made since no extended defect
s have been observed in the low dose range, For the high dose implant,
extended defect formation has been reported and may be responsible fo
r the tensile peak. After annealing, the low angle shoulder on the low
dose implant has disappeared, while the high dose implant exhibits an
increase in the tensile strain from 6.5 x 10(-4) to 9.3 x 10(-4) afte
r 24 h of annealing and then decreases in tensile strain to 7.3 x 10(-
4) after 48 h of annealing. It is believed the changes in strain are a
ssociated with. the Oswald ripening and dissolution of extended defect
s, which has been observed during annealing of ion implanted Si.