INGAAS INP THERMOELECTRIC INFRARED-SENSOR UTILIZING SURFACE-BULK MICROMACHINING TECHNOLOGY/

Citation
A. Dehe et al., INGAAS INP THERMOELECTRIC INFRARED-SENSOR UTILIZING SURFACE-BULK MICROMACHINING TECHNOLOGY/, I.E.E.E. transactions on electron devices, 44(7), 1997, pp. 1052-1059
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
44
Issue
7
Year of publication
1997
Pages
1052 - 1059
Database
ISI
SICI code
0018-9383(1997)44:7<1052:IITIUS>2.0.ZU;2-F
Abstract
A novel InGaAs/InP micromachined thermoelectric sensor is presented, T he key features of the reported sensors are the high thermal resistivi ty and high mobility of InGaAs lattice matched to InP, combined with a value of Seebeck coefficient that is acceptable for such applications , The anisotropic and selective surface bulk micromachining properties of this material system were successfully applied to devices aligned along the [010] orientation on a [100] InP wafer and the details of th e technology used for this purpose are presented, A responsivity of 18 4 V/W and a relative detectivity of 7.1 x 10(8) cm Hz(-1/2)/W have bee n demonstrated using this new sensor approach.