M. Balucani et al., CHARACTERIZATION OF SILICON LEDS INTEGRATED WITH OXIDIZED POROUS SILICON SOI, Microelectronic engineering, 36(1-4), 1997, pp. 115-118
Slightly modified CMOS process has been used for the formation of late
ral pn junctions in SOI structures based on oxidized porous silicon. U
nder forward bias these junctions emit infrared light at 1120 nm. Unde
r reverse bias in the breakdown regime the pn junctions demonstrate bo
th infrared and visible light emissions with efficiencies of 10(-4) an
d 10(-7), respectively. The beneficial influence of SOI structures on
electroluminescence characterictics of light-emitting pn junctions has
been established.