Ca. Billman et al., IDENTIFICATION OF THE MICROSCOPIC STRUCTURE OF NEW HOT-CARRIER DAMAGECENTERS IN SHORT-CHANNEL MOSFETS, Microelectronic engineering, 36(1-4), 1997, pp. 271-274
We show, for the first time, that E' centers can be generated in hot h
ole stressing of short channel metal oxide silicon field effect transi
stors (MOSFETs). Prior to this study only P-b centers had been directl
y linked to this stressing phenomena.