THERMAL-OXIDATION OF NIS INP STRUCTURES

The kinetics and mechanisms of processes involved in the thermal oxida tion of NiS/InP structures in oxygen were investigated. Surface oxidat ion involves the following sequence of phase changes: nickel sulfide - -> sulfate ---> oxide. Simultaneously, reactions at the film/substrate interface yield In2S3 and NiP2. With increasing oxidation temperature and/or time, the indium content of the film rises. Reaction of indium with nickel oxide and sulfate leads to rapid formation of In2O3. This step, controlled by indium diffusion, makes the major contribution to film growth.