Tc. Isabell et Vp. Dravid, RESOLUTION AND SENSITIVITY OF ELECTRON BACKSCATTERED DIFFRACTION IN ACOLD FIELD-EMISSION GUN SEM, Ultramicroscopy, 67(1-4), 1997, pp. 59-68
The tradeoff between sensitivity and spatial resolution is inherent in
all analytical techniques. Electron backscattered diffraction (EBSD)
in a scanning electron microscope (SEM) is no exception, and determini
ng this tradeoff for EBSD is the focus of this contribution. Because t
he specimen is tilted in EBSD (typically at 70 degrees), the spatial r
esolution needs to be defined with respect to three orthogonal directi
ons; as lateral resolution (within the specimen plane but normal to be
am direction), longitudinal resolution (within the specimen plane but
parallel to beam direction) and depth resolution (extent of depth info
rmation). The significance of these different resolution criteria beco
mes relevant for interface analysis, and is demonstrated using a varie
ty of materials systems and electron-optical parameters. The sensitivi
ty of EBSD is directly related to the ability of backscattered electro
ns (BSEs) to produce sufficient contrast in the Kikuchi pattern at the
recording medium (phosphor in our case). The various parameters which
govern the sensitivity of EBSD are discussed with the help of experim
ental analysis. It is argued that EBSD/OIM is a viable technique even
in a cold field emission gun SEM, where there is less absolute current
available and stability of current is less than for other electron so
urces.