VAPOR-DEPOSITED ORGANIC THIN-FILM IN MICROGRAVITY

Citation
Mi. Zugrav et al., VAPOR-DEPOSITED ORGANIC THIN-FILM IN MICROGRAVITY, Journal of crystal growth, 174(1-4), 1997, pp. 130-138
Citations number
19
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
174
Issue
1-4
Year of publication
1997
Pages
130 - 138
Database
ISI
SICI code
0022-0248(1997)174:1-4<130:VOTIM>2.0.ZU;2-B
Abstract
Organic thin films have been grown in space by effusive ampoule physic al vapor transport technique with different growth parameters for the source temperature, transport flux, substrate, seeding, and backfillin g. Results described in this paper are based on data from the two Unit ed States Space Shuttle Endeavour flights, STS (Space Transportation S ystem)-59 and STS-69, using the moderate temperature facility (MTF) fo r materials processing in space. The facility consists primarily of th e effusive ampoule, in which the thin film growth process takes place, encased in two concentric aluminum cylinders with a vacuum space betw een them. The MTF has produced thin films of variable quality and thic kness across 12 mm diameter substrates. The results are discussed with reference to the growth parameters.