OPTICAL-PUMPED LASING OF DOPED ZNSE EPILAYERS GROWN BY MOVPE

Citation
Gp. Yablonskii et al., OPTICAL-PUMPED LASING OF DOPED ZNSE EPILAYERS GROWN BY MOVPE, Journal of crystal growth, 174(1-4), 1997, pp. 763-767
Citations number
11
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
174
Issue
1-4
Year of publication
1997
Pages
763 - 767
Database
ISI
SICI code
0022-0248(1997)174:1-4<763:OLODZE>2.0.ZU;2-T
Abstract
Laser action in undoped, nitrogen and chlorine doped ZnSe epitaxial la yers has been investigated for pulsed optical excitation with a 1kHz r epetition rate by N-2 laser radiation from liquid-nitrogen temperature s up to near room temperature. The highest value of the laser energy a nd power output of ZnSe lasers were E = 5 x 10(-8) J and P = 5 CV at I -exc = 800 kW/cm(2). The laser line positions are between lambda = 449 and 456 nm. II was shown that doping of ZnSe with both acceptor or do nor impurities as well as using a ZnMgSSe barrier layer between the Zn Se active layer and the substrate is favourable to increase the PL eff iciency and to decrease the laser threshold. The lowest threshold valu e (130-150 kW/cm(2)) was achieved in ZnSe:N grown with hydrogen carrie r gas. The results obtained from the measurements of the laser line po sitions as well as from the evaluation of the nonequilibrium carrier c oncentration proves that the ZnSe lasing mechanism under the excitatio n of the N-2 laser radiation is the recombination in an electron-hole plasma.