ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED DIRECT-CURRENT SPUTTERING DISCHARGE WITH MAGNETIC-MIRROR PLASMA-CONFINEMENT

Plasma confinement in a mirror magnetic field was applied to the elect ron cyclotron resonance (ECR) plasma enhanced de sputtering discharge sustained at pressures below 10(-2) Pa. Ion current densities up to 12 mA/cm(2), plasma densities about 10(11) cm(-3) and electron temperatu res about 25 eV were measured by a Langmuir probe. The cathode current was maximum when the ECR zone was close to the cathode z(ECR)<10 cm ( measured from the center of the cathode). A mirror ratio MR greater th an or equal to 3 was necessary for sustaining the discharge at simulta neously large microwave powers and cathode voltages. An application of the system studied to the ion assisted deposition of metallic and com pound thin films with a controlled crystal structure is proposed. (C) 1997 American Vacuum Society.