CHARACTERIZATION OF CARBON AND CARBON NITRIDE THIN-FILMS USING TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY

methodology for quantitative measurement of nitrogen and hydrogen atom ic composition of thin carbon nitride film using time-of-flight second ary-ion-mass spectrometry is demonstrated. The nitrogen and hydrogen c ompositions of the film are determined by the selected ion fragment in tensity ratios ICN-/IC2- and IC2H-/IC2- measured in the negative-ion-m ass spectrum of the film, respectively. Absolute values for hydrogen a nd nitrogen atomic compositions are extracted by calibration with nucl ear reaction analysis and hydrogen forward scattering methods. The mea sured ion fragment mass intensities were also used to characterize the structure of the carbon nitride films. The results are compared with those measured from x-ray photoemission spectroscopy. (C) 1997 America n Vacuum Society.