LOW-THRESHOLD 1.3 MU-M INASP GAINASP LASERS GROWN BY SOLID-SOURCE MOLECULAR-BEAM EPITAXY/

Citation
Cc. Wamsley et al., LOW-THRESHOLD 1.3 MU-M INASP GAINASP LASERS GROWN BY SOLID-SOURCE MOLECULAR-BEAM EPITAXY/, Journal of crystal growth, 175, 1997, pp. 42-45
Citations number
20
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
175
Year of publication
1997
Part
1
Pages
42 - 45
Database
ISI
SICI code
0022-0248(1997)175:<42:L1MIGL>2.0.ZU;2-G
Abstract
A threshold current density of 270 A/cm(2) has been measured for 2 mm long InAsP/GaInAsP broad area laser grown by solid source molecular be am epitaxy. To date, these are the lowest reported threshold current d ensity 1.3 mu m lasers by any type of MBE growth technique. An optimum growth temperature of 465 degrees C was determined for InAsP by maxim izing the photoluminescence intensity from a test structure modeled af ter the laser core, and a room-temperature photoluminescenced line wid th of 18 meV was measured on an actual laser growth.