Cc. Wamsley et al., LOW-THRESHOLD 1.3 MU-M INASP GAINASP LASERS GROWN BY SOLID-SOURCE MOLECULAR-BEAM EPITAXY/, Journal of crystal growth, 175, 1997, pp. 42-45
A threshold current density of 270 A/cm(2) has been measured for 2 mm
long InAsP/GaInAsP broad area laser grown by solid source molecular be
am epitaxy. To date, these are the lowest reported threshold current d
ensity 1.3 mu m lasers by any type of MBE growth technique. An optimum
growth temperature of 465 degrees C was determined for InAsP by maxim
izing the photoluminescence intensity from a test structure modeled af
ter the laser core, and a room-temperature photoluminescenced line wid
th of 18 meV was measured on an actual laser growth.