An investigation is reported on the growth of homogeneously and delta-
doped ZnS:Mn layers. Bath undoped and Mn-doped ZnS thin films were gro
wn by MBE and GSMBE using a sulfur overpressure. Photoluminescence mea
surements on undoped material indicated that high crystal quality was
obtained, with band edge emission intensity several orders of magnitud
e higher than that from the self-activation peak. for a growth tempera
ture of 180 degrees C. Homogeneously doped ZnS:Mn films showed a maxim
um brightness at a Mn concentration of 3 mol% before luminescence quen
ching was observed. The delta-doping technique was shown to quadruple
the photoluminescence intensity compared to equivalently doped homogen
eous material grown under the same conditions. The optimum distance be
tween doping planes for a constant in-plane concentration was found to
be 9-15 nm. SIMS studies of the diffusion behavior of Mn into the und
oped ZnS layers revealed broad Mn peaks with a FWHM of about 10 nm.