Multizone uniformity control of a CMP process utilizing a pre- and postmeasurement strategy

Authors
Moyne, J El Chemali, C Khan, K Nadeau, R Smith, P Colt, J Chapple-Sokol, J Parikh, T
Citation
J. Moyne et al., Multizone uniformity control of a CMP process utilizing a pre- and postmeasurement strategy, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 231-248
Categorie Soggetti
Current Book Contents
Journal title
RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING → ACNP
Year of publication
2001
Pages
231 - 248
Database
ISI
SICI code