AAAAAA

   
Results: 1-22 |

Table of contents of journal:

Results: 22
Run-to-run control in semiconductor manufacturing - Introduction
Authors: Moyne, J Hurwitz, AM
Citation: J. Moyne et Am. Hurwitz, Run-to-run control in semiconductor manufacturing - Introduction, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 1-11
Advanced process control in the semiconductor industry
Authors: Smith, TH Boning, DS Moyne, J
Citation: Th. Smith et al., Advanced process control in the semiconductor industry, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 15-44
Process control and optimization methods for run-to-run application
Authors: Del Castillo, E Hurwitz, AM
Citation: E. Del Castillo et Am. Hurwitz, Process control and optimization methods for run-to-run application, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 45-63
Basic R2R control algorithms
Authors: Moyne, W
Citation: W. Moyne, Basic R2R control algorithms, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 67-79
Learning and optimization algorithms for an optimizing adaptive quality controller
Authors: Del Castillo, E
Citation: E. Del Castillo, Learning and optimization algorithms for an optimizing adaptive quality controller, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 81-89
An adaptive run-to-run optimizing controller for linear and nonlinear processes
Authors: Hurwitz, AM Del Castillo, E
Citation: Am. Hurwitz et E. Del Castillo, An adaptive run-to-run optimizing controller for linear and nonlinear processes, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 91-100
A comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry
Authors: Ning, Z Moyne, JR Smith, TH Boning, DS Del Castillo, E Yeh, JY Hurwitz, AM
Citation: Z. Ning et al., A comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 101-111
Existing and envisioned control environment for semiconductor manufacturing
Authors: Moyne, J White, J
Citation: J. Moyne et J. White, Existing and envisioned control environment for semiconductor manufacturing, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 115-124
Design requirements for an integrative R2R control solution
Authors: Moyne, J
Citation: J. Moyne, Design requirements for an integrative R2R control solution, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 125-129
The Generic Cell Controller (GCC)
Authors: Moyne, J
Citation: J. Moyne, The Generic Cell Controller (GCC), RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 131-164
Derivation of a piggyback run-to-run control solution design
Authors: Moyne, J
Citation: J. Moyne, Derivation of a piggyback run-to-run control solution design, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 165-175
Integrated run-to-run control solution examples
Authors: Moyne, J
Citation: J. Moyne, Integrated run-to-run control solution examples, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 177-189
Design and optimization of an optimizing adaptive quality controller, generic cell controller-enabled solution
Authors: Del Castillo, E Yeh, JY Moyne, J Solakhian, V
Citation: E. Del Castillo et al., Design and optimization of an optimizing adaptive quality controller, generic cell controller-enabled solution, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 191-200
Case study: Furnace capability improvement using a customized R2R control solution
Authors: Hurwitz, A Moyne, J
Citation: A. Hurwitz et J. Moyne, Case study: Furnace capability improvement using a customized R2R control solution, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 203-217
Process recipe optimization
Authors: Del Castillo, E
Citation: E. Del Castillo, Process recipe optimization, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 219-228
Multizone uniformity control of a CMP process utilizing a pre- and postmeasurement strategy
Authors: Moyne, J El Chemali, C Khan, K Nadeau, R Smith, P Colt, J Chapple-Sokol, J Parikh, T
Citation: J. Moyne et al., Multizone uniformity control of a CMP process utilizing a pre- and postmeasurement strategy, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 231-248
Control of photolithography alignment
Authors: Patel, NS Soper, RA
Citation: Ns. Patel et Ra. Soper, Control of photolithography alignment, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 249-260
Age-based double EWMA controller and its application to a CMP process
Authors: Chen, AG Guo, RS
Citation: Ag. Chen et Rs. Guo, Age-based double EWMA controller and its application to a CMP process, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 261-276
Advancements in chemical mechanical planarization process automation and control
Authors: Moyne, J
Citation: J. Moyne, Advancements in chemical mechanical planarization process automation and control, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 279-287
An enhanced EWMA controller for processes subject to random disturbances
Authors: Guo, RS Chen, AG Chen, JJ
Citation: Rs. Guo et al., An enhanced EWMA controller for processes subject to random disturbances, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 289-308
Enabling generic interprocess multistep control: The active controller
Authors: Chaudhry, N Moyne, J Rundensteiner, EA
Citation: N. Chaudhry et al., Enabling generic interprocess multistep control: The active controller, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 309-323
Run-to-run control in semiconductor manufacturing - Summary and conclusions
Citation: Run-to-run control in semiconductor manufacturing - Summary and conclusions, RUN-TO-RUN CONTROL IN SEMICONDUCTOR MANUFACTURING, 2001, pp. 325-333
Risultati: 1-22 |