Evolution of the interfacial electronic structure during thermal oxidation

Authors
Muller, DA Neaton, JB
Citation
Da. Muller et Jb. Neaton, Evolution of the interfacial electronic structure during thermal oxidation, SPR S MAT S, 46, 2001, pp. 219-246
Categorie Soggetti
Current Book Contents","Current Book Contents
Journal title
FUNDAMENTAL ASPECTS OF SILICON OXIDATION → ACNP
ISSN journal
0933033X
Volume
46
Year of publication
2001
Pages
219 - 246
Database
ISI
SICI code
0933-033X(2001)46:<219:EOTIES>2.0.ZU;2-U