Characterization of the anomalous lattice-relaxation process in InAsP/InGaAsP strained layer superlattices by X-ray diffraction measurements

Authors
Nakashima, K
Citation
K. Nakashima, Characterization of the anomalous lattice-relaxation process in InAsP/InGaAsP strained layer superlattices by X-ray diffraction measurements, OPTOEL PROP, 9, 2000, pp. 513-568
Categorie Soggetti
Current Book Contents
Journal title
INP AND RELATED COMPOUNDS : MATERIALS, APPLICATIONS AND DEVICES → ACNP
Volume
9
Year of publication
2000
Pages
513 - 568
Database
ISI
SICI code