NOISE PARAMETER MODELING FOR INP-BASED PSEUDOMORPHIC HEMTS
Citation
Y. Ando et al., NOISE PARAMETER MODELING FOR INP-BASED PSEUDOMORPHIC HEMTS, I.E.E.E. transactions on electron devices, 44(9), 1997, pp. 1367-1374
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
SICI code
0018-9383(1997)44:9<1367:NPMFIP>2.0.ZU;2-9
Abstract
The effect of electron mobility (mu(n)) on noise properties for InP-ba
sed pseudomorphic HEMT's has been analyzed based on the impedance fiel
d model, The analysis predicts that increasing mu(n) improves the mini
mum noise figure (F-min) and associated gain not only because the unit
y current gain cut-off frequency increases but also because the source
resistance is reduced, The analysis also predicts that increasing mu(
n) reduces the input noise resistance due to higher transconductance b
ut hardly influences the noise-optimum impedance, Furthermore, it is p
redicted that the decrease in F-min with increasing mu(n) becomes less
significant above 11000 cm(2)/V s due to larger diffusion noise, Calc
ulated results compare well with the measured scattering and noise par
ameters for InxGa1-xAs (x = 0.53, 0.7, and 0.8) channel devices, Simil
ar dependence of noise parameters on mu(n) is shown in the theoretical
and experimental results.