EFFECT OF SUBSTRATE-TEMPERATURE AND ANNEALING ON THE STRUCTURAL-PROPERTIES OF ZNO ULTRAFINE PARTICLE FILMS

ZnO ultrafine particle (UFP) films were deposited on glass and SiO2 su bstrates by a direct current gas discharge activated reactive evaporat ion method. The effect of substrate temperature and annealing on the s tructure and morphology of ZnO UFP films was studied by x-ray diffract ion and scanning electron microscope. The results show that the spheri cal island density decreases with increasing annealing temperature and the structure becomes polycrystalline with a (002) preferential orien tation as the substrate temperature increases. In addition, angle reso lved x-ray photoelectron spectroscopy was used to study the absorption of water on the ZnO UFP film surface by measuring the two deconvolute d peaks for O 1s. The two deconvoluted peaks for O 1s were located at 533.2 and 534.8 eV. The absorption coefficients of water on the surfac e were 0.52 and 0.43, respectively, for nonannealed and annealed ZnO U FP films. (C) 1997 American Vacuum Society.