NANOMETER TABLE-TOP PROXIMITY X-RAY-LITHOGRAPHY WITH LIQUID-TARGET LASER-PLASMA SOURCE

A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The la ser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with onl y negligible debris production. The Au/SiNx x-ray mask is fabricated b y employing ion milling and a high-contrast e-beam resist. With SAL-60 1 chemically enhanced resist we demonstrate fabrication of high-aspect -ratio, sub-100 nm structures. The exposure time is currently 20 min u sing a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for ope ration with future, e.g., 1000 Hz, lasers resulting in projected expos ure times of similar to 10 s. (C) 1997 American Vacuum Society.