NANOSTRUCTURE FABRICATION VIA DIRECT WRITING WITH ATOMS FOCUSED IN LASER FIELDS

The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to for m a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to de posit a series of lines spaced by half the laser wavelength. We descri be the fabrication of a Cr nanograting formed using this new technique . The experimental arrangement for deposition and the optical collimat ion of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM)images of the resulting nanostructur es are presented.