ANALYSIS OF IODINE INCORPORATION IN MBE GROWN CDTE AND HGCDTE

Citation
A. Parikh et al., ANALYSIS OF IODINE INCORPORATION IN MBE GROWN CDTE AND HGCDTE, Journal of electronic materials, 26(9), 1997, pp. 1065-1069
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
26
Issue
9
Year of publication
1997
Pages
1065 - 1069
Database
ISI
SICI code
0361-5235(1997)26:9<1065:AOIIIM>2.0.ZU;2-P
Abstract
A study is reported of the dynamics of dopant incorporation in iodine doped CdTe. Using a mathematical formulation, the iodine doping profil es in CdTe and HgCdTe have been fitted to experiment to obtain materia l parameters such as the bulk and surface diffusion and the segregatio n energy. Dopant profile fitting showed that iodine diffusion was insi gnificant and gave an iodine segregation energy of 0.6 eV and a surfac e diffusivity enhancement factor of 300 at a growth temperature of 230 degrees C. The model was used to determine the effect of the growth r ate and temperature for particular growth conditions.