GROWTH OF EPITAXIAL STRONTIUM BARIUM NIOBATE THIN-FILMS BY SOLID SOURCE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION

Citation
Mk. Lee et Rs. Feigelson, GROWTH OF EPITAXIAL STRONTIUM BARIUM NIOBATE THIN-FILMS BY SOLID SOURCE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION, Journal of crystal growth, 180(2), 1997, pp. 220-228
Citations number
20
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
180
Issue
2
Year of publication
1997
Pages
220 - 228
Database
ISI
SICI code
0022-0248(1997)180:2<220:GOESBN>2.0.ZU;2-B
Abstract
Strontium barium niobate (SrxBa1-xNb2O6) thin films have been epitaxia lly grown on (0 0 1)MgO, (1 1 0)MgO and (0 0 1)Sr0.75Ba0.25Nb2O6 subst rates by solid source metal-organic chemical vapor deposition. Films b ecame amorphous when the substrate temperature was below 535 degrees C . The crystallinity of the him improved approximately with decreasing growth rate. Film compositions could be controlled by varying source c ompositions. Single crystalline films were deposited on (0 0 1)Sr0.75B a0.25Nb2O6 single crystal substrates while films grown on (0 0 1)MgO a nd (1 1 0)MgO substrates revealed four in-plane orientations. Waveguid ing behavior was demonstrated for both TE and TM modes with the films grown on (0 0 1)MgO substrates. The measured refractive indices were i n agreement with those of bulk crystal.