UHV-AFM STUDY OF MBE-GROWN 10 NM SCALE RIDGE QUANTUM WIRES

Citation
S. Koshiba et al., UHV-AFM STUDY OF MBE-GROWN 10 NM SCALE RIDGE QUANTUM WIRES, Journal of crystal growth, 175, 1997, pp. 804-808
Citations number
15
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
175
Year of publication
1997
Part
2
Pages
804 - 808
Database
ISI
SICI code
0022-0248(1997)175:<804:USOM1N>2.0.ZU;2-Y
Abstract
We evaluate the shape of ridge quantum wires (RQWIs) with nm-scale res olution by using SEM and ultra-high vacuum (UHV) AFM system which is c onnected to MBE chamber. This MBE-AFM system provides us a detailed in formation about the evolution of size and uniformity of ridges grown u nder various conditions. In this report, we investigate systematically how the growth temperature T-s and As flux affect the width and morph ology of GaAs ridge structure. The results show that a very sharp and uniform GaAs ridge structures (W < 10 nm) can be obtained. Ou the basi s of this understanding, we fabricated the ridge quantum wire of 10 nm width.