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Results: 1-25/108
Authors:
CHIKAWA J
OYANAGI H
Citation: J. Chikawa et H. Oyanagi, APPLICATIONS OF SYNCHROTRON-RADIATION TO MATERIAL SCIENCE - FOREWORD, Optoelectronics, 11(1), 1996, pp. 1-2
Authors:
MITA Y
Citation: Y. Mita, IMPORTANT NOTICE FOR OP-DET READERS AND CONTRIBUTORS, Optoelectronics, 11(1), 1996, pp. 1-1
Authors:
TAKAKUWA Y
ENTA Y
MIYAMOTO N
Citation: Y. Takakuwa et al., IN-SITU OBSERVATION OF THE SURFACE-REACTION DURING SYNCHROTRON RADIATION-ASSISTED GAS-SOURCE MOLECULAR-BEAM EPITAXY OF SILICON, Optoelectronics, 11(1), 1996, pp. 3-22
Authors:
UTSUMI Y
Citation: Y. Utsumi, SYNCHROTRON RADIATION-EXCITED SI PHOTOEPITAXY USING GAS-SOURCE MBE, Optoelectronics, 11(1), 1996, pp. 23-42
Authors:
SATO F
HIRANO Y
KAJIYAMA H
SUZUKI R
MOTOOKA T
CHIKAWA J
TAKIZAWA K
Citation: F. Sato et al., STRUCTURAL-CHANGE OF AMORPHOUS-SILICON INDUCED BY X-RAY-IRRADIATION FROM SYNCHROTRON-RADIATION, Optoelectronics, 11(1), 1996, pp. 43-50
Authors:
AWAZU K
ONUKI H
Citation: K. Awazu et H. Onuki, PHOTO-STIMULATED STRUCTURAL-CHANGE IN A-SIO2 FILM WITH UNDULATOR RADIATION, Optoelectronics, 11(1), 1996, pp. 51-56
Authors:
URISU T
YOSHIGOE A
IMAIZUMI Y
Citation: T. Urisu et al., SYNCHROTRON RADIATION-STIMULATED SEMICONDUCTOR PROCESS AND NEW PROSPECTS OF CORE ELECTRON-EXCITATION PHOTOCHEMISTRY, Optoelectronics, 11(1), 1996, pp. 57-70
Authors:
NISHIYAMA I
UESUGI F
Citation: I. Nishiyama et F. Uesugi, CORE ELECTRON-EXCITATION EFFECTS ON ALUMINUM CHEMICAL-VAPOR-DEPOSITION, Optoelectronics, 11(1), 1996, pp. 71-80
Authors:
MOCHIJI K
Citation: K. Mochiji, SURFACE-REACTION WITH CORE ELECTRON-EXCITATION, Optoelectronics, 11(1), 1996, pp. 81-90
Authors:
UENO N
KAMIYA K
HARADA Y
TINONE MCK
SEKITANI T
TANAKA K
Citation: N. Ueno et al., SYNCHROTRON-RADIATION AS A SCALPEL FOR MOLECULAR-SYSTEMS - EVIDENCE OF SITE-SPECIFIC CHEMICAL-BOND SCISSION OF PMMA BY OXYGEN IS ELECTRON-EXCITATION, Optoelectronics, 11(1), 1996, pp. 91-98
Authors:
TERAKADO S
SUZUKI S
Citation: S. Terakado et S. Suzuki, POSSIBILITY OF MICROFABRICATION BY SYNCHROTRON RADIATION-EXCITED ETCHING, Optoelectronics, 11(1), 1996, pp. 99-112
Authors:
SUGITA Y
SAITO Y
NARA Y
Citation: Y. Sugita et al., NOVEL DRY-ETCHING TECHNIQUE USING VUV LIGHT-INDUCED SURFACE-REACTIONS, Optoelectronics, 11(1), 1996, pp. 113-126
Authors:
NUNOSHITA M
MARUMOTO K
ABE H
Citation: M. Nunoshita et al., SR X-RAY-LITHOGRAPHY TECHNOLOGIES FOR 1 GBIT-SCALE DRAM FABRICATION PROCESS, Optoelectronics, 11(1), 1996, pp. 127-140
Authors:
KIKUCHI M
Citation: M. Kikuchi, PHYSICS SIMULATION, Optoelectronics, 11(1), 1996, pp. 142-143
Authors:
ETORI A
Citation: A. Etori, EXPECTATIONS FOR OPTOELECTRONICS, Optoelectronics, 11(1), 1996, pp. 143-144
Authors:
NISHINO T
Citation: T. Nishino, PHOTON-ORIENTED OPTOELECTRONICS, Optoelectronics, 11(1), 1996, pp. 144-145
Authors:
KUWANO Y
Citation: Y. Kuwano, OPTOELECTRONICS - LIGHTING THE WAY TO A NEW INFORMATION AGE, Optoelectronics, 11(1), 1996, pp. 146-147
Authors:
NUNOSHITA M
Citation: M. Nunoshita, WHAT KINDS OF IMAGING DEVICES DO WE NEED IN MOVING TOWARD THE MULTIMEDIA ERA, Optoelectronics, 11(1), 1996, pp. 148-150
Authors:
HIROSE M
Citation: M. Hirose, OPTICAL INTERCONNECTS FOR FUTURE INTEGRATED SYSTEMS, Optoelectronics, 11(1), 1996, pp. 150-151
Authors:
SASAKI A
Citation: A. Sasaki, DREAM OR ILLUSION OF ELECTRONICS IN THE COMING CENTURY, Optoelectronics, 11(1), 1996, pp. 152-152
Authors:
WATANABE H
Citation: H. Watanabe, WHAT COMES AFTER SILICON, Optoelectronics, 11(1), 1996, pp. 153-154
Authors:
YAMASE H
Citation: H. Yamase, THE DEVELOPMENT AND OUTLOOK FOR THE COMBINED PED ON THE SILICON SUBSTRATE TOWARD 21ST-CENTURY, Optoelectronics, 11(1), 1996, pp. 154-155
Authors:
ISHIDA A
Citation: A. Ishida, COLLABORATION PROGRAMS ACCELERATING THE GROWTH OF PROFITABLE OPTOELECTRONICS INDUSTRY, Optoelectronics, 11(1), 1996, pp. 156-157
Authors:
HAMAKAWA Y
Citation: Y. Hamakawa, LAUNCHING THE PHOTOVOLTAIC NEW-ENERGY REVOLUTION, Optoelectronics, 11(1), 1996, pp. 158-159
Authors:
SUZUKI T
SUZUKI Y
YOSHIKAWA S
Citation: T. Suzuki et al., FOR HIGH-DENSITY OPTICAL INFORMATION-STORAGE - FOREWORD, Optoelectronics, 10(3), 1995, pp. 293-295