Citation: Ak. Stamper et al., PLASMA-INDUCED GATE-OXIDE CHARGING ISSUES FOR SUB-0.5 MU-M COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGIES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 905-911
Authors:
CHESEBRO DG
ADKISSON JW
CLARK LR
ESLINGER SN
FAUCHER MA
HOLMES SJ
MALLETTE RP
NOWAK EJ
SENGLE EW
VOLDMAN SH
WEEKS TW
Citation: Dg. Chesebro et al., OVERVIEW OF GATE LINEWIDTH CONTROL IN THE MANUFACTURE OF CMOS LOGIC CHIPS, IBM journal of research and development, 39(1-2), 1995, pp. 189-200
Authors:
KOBURGER CW
CLARK WF
ADKISSON JW
ADLER E
BAKEMAN PE
BERGENDAHL AS
BOTULA AB
CHANG W
DAVARI B
GIVENS JH
HANSEN HH
HOLMES SJ
HORAK DV
LAM CH
LASKY JB
LUCE SE
MANN RW
MILES GL
NAKOS JS
NOWAK EJ
SHAHIDI G
TAUR Y
WHITE FR
WORDEMAN MR
Citation: Cw. Koburger et al., A HALF-MICRON CMOS LOGIC GENERATION, IBM journal of research and development, 39(1-2), 1995, pp. 215-227
Authors:
NASSERBAKHT GN
ADKISSON JW
WOOLEY BA
HARRIS JS
KAMINS TI
Citation: Gn. Nasserbakht et al., A MONOLITHIC GAAS-ON-SI RECEIVER FRONT-END FOR OPTICAL INTERCONNECT SYSTEMS, IEEE journal of solid-state circuits, 28(6), 1993, pp. 622-630