Citation: Mn. Kozicki et al., THE USE OF ELECTRON-BEAM EXPOSURE AND CHEMICALLY ENHANCED VAPOR ETCHING OF SIO2 FOR NANOSCALE FABRICATION, Physica. B, Condensed matter, 227(1-4), 1996, pp. 318-322
Citation: J. Allgair et al., FORMATION OF NANOSCALE COBALT SILICIDE AND GOLD WIRES USING ELECTRON-BEAM AND CHEMICALLY ENHANCED VAPOR ETCHING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1855-1859
Authors:
WHIDDEN TK
ALLGAIR J
RYAN JM
KOZICKI MN
FERRY DK
Citation: Tk. Whidden et al., CATALYZED HF VAPOR ETCHING OF SILICON DIOXIDE FOR MICROLITHOGRAPHIC AND NANOLITHOGRAPHIC MASKS, Journal of the Electrochemical Society, 142(4), 1995, pp. 1199-1205