Authors:
KIM K
AN MH
SHIN YG
SUH MS
YOUN CJ
LEE YH
LEE KB
LEE HJ
Citation: K. Kim et al., OXIDE-GROWTH ON SILICON (100) IN THE PLASMA PHASE OF DRY OXYGEN USINGAN ELECTRON-CYCLOTRON-RESONANCE SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2667-2673
Authors:
AN MH
SUH MS
KIM KJ
YOUN CJ
NAHM KS
LEE KB
Citation: Mh. An et al., CHARACTERISTICS OF N-BOND STRUCTURES IN SILICON-OXIDE FILMS DEPOSITEDBY ECR PLASMA CVD WITH A SIH4 N2O GAS-MIXTURE WHEN ADDING N-2/, Journal of the Korean Physical Society, 29(3), 1996, pp. 384-391
Authors:
KIM K
SUH MS
KIM TS
YOUN CJ
SUH EK
SHIN YJ
LEE KB
LEE HJ
AN MH
LEE HJ
RYU H
Citation: K. Kim et al., ROOM-TEMPERATURE VISIBLE PHOTOLUMINESCENCE FROM SILICON-RICH OXIDE LAYERS DEPOSITED BY AN ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE, Applied physics letters, 69(25), 1996, pp. 3908-3910
Citation: Sg. Zhan et al., STUDIES ON ADIABATIC THERMOKINETICS .4. T HERMOKINETIC RESEARCH OF REVERSIBLE-REACTIONS, Huaxue xuebao, 51(10), 1993, pp. 937-942