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Results: 1-13 |
Results: 13
ADVANCES IN SELECTIVE WET OXIDATION OF ALGAAS ALLOYS
Authors: CHOQUETTE KD GEIB KM ASHBY CIH TWESTEN RD BLUM O HOU HQ FOLLSTAEDT DM HAMMONS BE MATHES D HULL R
Citation: Kd. Choquette et al., ADVANCES IN SELECTIVE WET OXIDATION OF ALGAAS ALLOYS, IEEE journal of selected topics in quantum electronics, 3(3), 1997, pp. 916-926
WET OXIDATION OF ALGAAS - THE ROLE OF HYDROGEN
Authors: ASHBY CIH SULLIVAN JP CHOQUETTE KD GEIB KM HOU HQ
Citation: Cih. Ashby et al., WET OXIDATION OF ALGAAS - THE ROLE OF HYDROGEN, Journal of applied physics, 82(6), 1997, pp. 3134-3136
BARRIER-LAYER-THICKNESS CONTROL OF SELECTIVE WET OXIDATION OF ALGAAS FOR EMBEDDED OPTICAL-ELEMENTS
Authors: BLUM O ASHBY CIH HOU HQ
Citation: O. Blum et al., BARRIER-LAYER-THICKNESS CONTROL OF SELECTIVE WET OXIDATION OF ALGAAS FOR EMBEDDED OPTICAL-ELEMENTS, Applied physics letters, 70(21), 1997, pp. 2870-2872
WET OXIDATION OF ALXGA1-XAS - TEMPORAL EVOLUTION OF COMPOSITION AND MICROSTRUCTURE AND THE IMPLICATIONS FOR METAL-INSULATOR-SEMICONDUCTOR APPLICATIONS
Authors: ASHBY CIH SULLIVAN JP NEWCOMER PP MISSERT NA HOU HQ HAMMONS BE HAFICH MJ BACA AG
Citation: Cih. Ashby et al., WET OXIDATION OF ALXGA1-XAS - TEMPORAL EVOLUTION OF COMPOSITION AND MICROSTRUCTURE AND THE IMPLICATIONS FOR METAL-INSULATOR-SEMICONDUCTOR APPLICATIONS, Applied physics letters, 70(18), 1997, pp. 2443-2445
WET THERMAL-OXIDATION OF ALASSB LATTICE-MATCHED TO INP FOR OPTOELECTRONIC APPLICATIONS
Authors: BLUM O GEIB KM HAFICH MJ KLEM JF ASHBY CIH
Citation: O. Blum et al., WET THERMAL-OXIDATION OF ALASSB LATTICE-MATCHED TO INP FOR OPTOELECTRONIC APPLICATIONS, Applied physics letters, 68(22), 1996, pp. 3129-3131
ETCHING PROCESSES FOR OPTOELECTRONIC DEVICES EMPLOYING PERIODIC MULTILAYERS OF INGAAS INALAS/
Authors: ASHBY CIH HOWARD AJ VAWTER GA BRIGGS RD HAFICH MJ
Citation: Cih. Ashby et al., ETCHING PROCESSES FOR OPTOELECTRONIC DEVICES EMPLOYING PERIODIC MULTILAYERS OF INGAAS INALAS/, Electronics Letters, 31(22), 1995, pp. 1948-1950
REACTIVE-ION-BEAM ETCHING OF INP IN A CHLORINE-HYDROGEN MIXTURE
Authors: VAWTER GA ASHBY CIH
Citation: Ga. Vawter et Cih. Ashby, REACTIVE-ION-BEAM ETCHING OF INP IN A CHLORINE-HYDROGEN MIXTURE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3374-3377
DI-CARBOXYLIC-ACID-BASED AND TRI-CARBOXYLIC-ACID-BASED ETCHES FOR PROCESSING HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS AND RELATED MATERIALS
Authors: GINLEY DS BARR L ASHBY CIH PLUT TA UREA D SIEGAL MP MARTENS JS JOHANSSON ME
Citation: Ds. Ginley et al., DI-CARBOXYLIC-ACID-BASED AND TRI-CARBOXYLIC-ACID-BASED ETCHES FOR PROCESSING HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS AND RELATED MATERIALS, Journal of materials research, 9(5), 1994, pp. 1126-1133
ULTRAVIOLET PHOTOSULFIDATION OF III-V COMPOUND SEMICONDUCTORS FOR ELECTRONIC PASSIVATION
Authors: ZAVADIL KR ASHBY CIH HOWARD AJ HAMMONS BE
Citation: Kr. Zavadil et al., ULTRAVIOLET PHOTOSULFIDATION OF III-V COMPOUND SEMICONDUCTORS FOR ELECTRONIC PASSIVATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1045-1049
ELECTROCHEMICAL SULFUR PASSIVATION OF VISIBLE (SIMILAR-TO-670 NM) ALGAINP LASERS
Authors: HOWARD AJ ASHBY CIH LOTT JA SCHNEIDER RP CORLESS RF
Citation: Aj. Howard et al., ELECTROCHEMICAL SULFUR PASSIVATION OF VISIBLE (SIMILAR-TO-670 NM) ALGAINP LASERS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1063-1067
HIGH-TEMPERATURE SUPERCONDUCTING SHIFT REGISTERS OPERATING AT UP TO 100 GHZ
Authors: MARTENS JS PANCE A CHAR K JOHANSSON ME WHITELEY SR WENDT JR HIETALA VM PLUT TA ASHBY CIH HOU SY PHILLIPS JM
Citation: Js. Martens et al., HIGH-TEMPERATURE SUPERCONDUCTING SHIFT REGISTERS OPERATING AT UP TO 100 GHZ, IEEE journal of solid-state circuits, 29(1), 1994, pp. 56-62
ULTRAVIOLET PHOTOSULFIDATION OF III-V COMPOUND SEMICONDUCTORS - A NEWAPPROACH TO SURFACE PASSIVATION
Authors: ASHBY CIH ZAVADIL KR HOWARD AJ HAMMONS BE
Citation: Cih. Ashby et al., ULTRAVIOLET PHOTOSULFIDATION OF III-V COMPOUND SEMICONDUCTORS - A NEWAPPROACH TO SURFACE PASSIVATION, Applied physics letters, 64(18), 1994, pp. 2388-2390
DICARBOXYLIC-ACID-BASED AND TRICARBOXYLIC-ACID-BASED ETCHES FOR PROCESSING HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS
Authors: GINLEY DS ASHBY CIH PLUT TA UREA D SIEGAL MP MARTENS JS
Citation: Ds. Ginley et al., DICARBOXYLIC-ACID-BASED AND TRICARBOXYLIC-ACID-BASED ETCHES FOR PROCESSING HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS, Applied physics letters, 63(17), 1993, pp. 2429-2431
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