Authors:
Lu, HC
Gusev, E
Yasuda, N
Green, M
Alers, G
Garfunkel, E
Gustafsson, T
Citation: Hc. Lu et al., The growth chemistry and interfacial properties of silicon oxynitride and metal oxide ultrathin films on silicon, APPL SURF S, 166(1-4), 2000, pp. 465-468