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Results: 1-9 |
Results: 9
Nanolithography in the evanescent near field
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Nanolithography in the evanescent near field, ADVAN MATER, 13(12-13), 2001, pp. 877
Low temperature nanoimprint lithography using silicon nitride molds
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Low temperature nanoimprint lithography using silicon nitride molds, MICROEL ENG, 57-8, 2001, pp. 367-373
A study of reactive ion etching damage effects in GaN
Authors: Rong, B Reeves, RJ Brown, SA Alkaisi, MM van der Drift, E Cheung, R Sloof, WG
Citation: B. Rong et al., A study of reactive ion etching damage effects in GaN, MICROEL ENG, 57-8, 2001, pp. 585-591
Analytic study of gratings patterned by evanescent near field optical lithography
Authors: McNab, SJ Blaikie, RJ Alkaisi, MM
Citation: Sj. Mcnab et al., Analytic study of gratings patterned by evanescent near field optical lithography, J VAC SCI B, 18(6), 2000, pp. 2900-2904
Effects of reactive ion etching on the electrical characteristics of GaN
Authors: Rong, B Cheung, R Gao, W Alkaisi, MM Reeves, RJ
Citation: B. Rong et al., Effects of reactive ion etching on the electrical characteristics of GaN, J VAC SCI B, 18(6), 2000, pp. 3467-3470
70 nm features on 140 nm period using Evanescent Near Field Optical Lithography
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., 70 nm features on 140 nm period using Evanescent Near Field Optical Lithography, MICROEL ENG, 53(1-4), 2000, pp. 237-240
Nanolithography using optical contact exposure in the evanescent near field
Authors: Blaikie, RJ Alkaisi, MM McNab, SJ Cumming, DRS Cheung, R Hasko, DG
Citation: Rj. Blaikie et al., Nanolithography using optical contact exposure in the evanescent near field, MICROEL ENG, 46(1-4), 1999, pp. 85-88
Sub-diffraction-limited patterning using evanescent near-field optical lithography
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ Cheung, R Cumming, DRS
Citation: Mm. Alkaisi et al., Sub-diffraction-limited patterning using evanescent near-field optical lithography, APPL PHYS L, 75(22), 1999, pp. 3560-3562
Nanolithography using wet etched silicon nitride phase mass
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Nanolithography using wet etched silicon nitride phase mass, J VAC SCI B, 16(6), 1998, pp. 3929-3933
Risultati: 1-9 |