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Results:
1-9
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Results: 9
Authors:
Alves, MAR
Rossetto, JF
Balachova, O
Braga, ED
Cescato, L
Citation: Mar. Alves et al., Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane, MICROELEC J, 32(9), 2001, pp. 783-786
Authors:
Fissore, A
Alves, MAR
Braga, ED
Cescato, L
Citation: A. Fissore et al., a-C : H films deposited on crystalline silicon to masking it anisotropic etching by aqueous ethylenediamine solution, MICROELEC J, 32(1), 2001, pp. 49-51
Authors:
de Souza, DR
Soares, LL
Cescato, L
Alves, MAR
Braga, ES
Citation: Dr. De Souza et al., Measurement of optical constants of thin a-C : H films, MICROELEC J, 31(4), 2000, pp. 251-254
Authors:
Balachova, OV
Alves, MAR
Swart, JW
Braga, ES
Cescato, L
Citation: Ov. Balachova et al., CF4 plasma etching of materials used in microelectronics manufacturing, MICROELEC J, 31(3), 2000, pp. 213-215
Authors:
Ruiz, A
Cansian, AM
Kuhn, GCS
Alves, MAR
Sene, FM
Citation: A. Ruiz et al., The Drosophila serido speciation puzzle: putting new pieces together, GENETICA, 108(3), 2000, pp. 217-227
Authors:
Fissore, A
Alves, MAR
Braga, ED
Cescato, L
Citation: A. Fissore et al., Mask of amorphous hydrogenated carbon films applied to chemical polishing and chemical dicing of silicon wafers, VACUUM, 55(1), 1999, pp. 23-25
Authors:
Alves, MAR
Balachova, O
Braga, EDS
Cescato, L
Citation: Mar. Alves et al., Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4, VACUUM, 52(3), 1999, pp. 313-314
Authors:
Fissore, A
Alves, MAR
Braga, ED
Cescato, L
Citation: A. Fissore et al., Application of alpha-C : H films to masking etching of silicon dioxide, MICROELEC J, 30(9), 1999, pp. 833-836
Authors:
Balachova, OV
Alves, MAR
Swart, JW
Braga, ES
Cescato, L
Citation: Ov. Balachova et al., Influence of the substrate thickness and radio frequency on the depositionrate of amorphous hydrogenated carbon a-C : H films, J APPL PHYS, 85(6), 1999, pp. 3345-3347
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