AAAAAA
Results:
1-9
|
Results: 9
Authors:
Arimitsu, K
Ichimura, K
Citation: K. Arimitsu et K. Ichimura, Phototriggered acid proliferation to enhance photosensitivity of chemically amplified photoresists, MACRO CH P, 202(3), 2001, pp. 453-460
Authors:
Arimitsu, K
Kudo, K
Ohmori, H
Ichimura, K
Citation: K. Arimitsu et al., Factors affecting photosensitivity enhancement of chemically amplified photoresists by an acid amplifier, J MAT CHEM, 11(2), 2001, pp. 295-301
Authors:
Arimitsu, K
Miyamoto, M
Ichimura, K
Citation: K. Arimitsu et al., Applications of a nonlinear organic reaction of carbamates to proliferate aliphatic amines, ANGEW CHEM, 39(19), 2000, pp. 3425
Authors:
Park, SW
Arimitsu, K
Ichimura, K
Citation: Sw. Park et al., Poly[(cis-3-(ethanesulfonyloxy)-2-pinanyl methacrylate)-co-(tert-butyl methacrylate)] as an acid-amplifying photoresist, MACRO RAPID, 21(15), 2000, pp. 1050-1053
Authors:
Park, SW
Arimitsu, K
Lee, S
Ichimura, K
Citation: Sw. Park et al., A novel photoresist based on polymeric acid amplifiers, CHEM LETT, (9), 2000, pp. 1036-1037
Authors:
Kanahara, T
Hirokawa, M
Fukuoka, K
Arimitsu, K
Manabe, T
Citation: T. Kanahara et al., Imprint cytology of an intrapulmonary lymph node, ACT CYTOL, 44(1), 2000, pp. 107-108
Authors:
Kudo, K
Arimitsu, K
Ohmori, H
Ito, H
Ichimura, K
Citation: K. Kudo et al., 3-phenyl-3,3-ethylenedioxy-1-propyl sulfonates as acid amplifiers to enhance the photosensitivity of positive-working photoresists, CHEM MATER, 11(8), 1999, pp. 2119-2125
Authors:
Kudo, K
Arimitsu, K
Ohmori, H
Ito, H
Ichimura, K
Citation: K. Kudo et al., Acid proliferation processes of 3-phenyl-3,3-ethylenedioxypropyl sulfonates in photosensitive polymer films leading to "air infection", CHEM MATER, 11(8), 1999, pp. 2126-2131
Authors:
Arimitsu, K
Imada, H
Citation: K. Arimitsu et H. Imada, Situations and cognitive appraisals in 'agari' experiences: Feature analyses of 'agari' experiences, JPN J PSYCH, 70(1), 1999, pp. 30-37
Risultati:
1-9
|