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Authors: SHIM JY CHI EJ BAIK HK LEE SM
Citation: Jy. Shim et al., STRUCTURAL, OPTICAL, AND FIELD-EMISSION PROPERTIES OF HYDROGENATED AMORPHOUS-CARBON FILMS GROWN BY HELICAL RESONATOR PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 37(2), 1998, pp. 440-444

Authors: YOON DS BAIK HK LEE SM LEE SI RYU H LEE HJ
Citation: Ds. Yoon et al., INVESTIGATION OF PT TA DIFFUSION BARRIER USING HYBRID CONDUCTIVE OXIDE (RUO2) FOR HIGH DIELECTRIC APPLICATIONS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1137-1141

Authors: CHI EJ SHIM JY CHOI DJ BAIK HK
Citation: Ej. Chi et al., EFFECTS OF HEAT-TREATMENT ON THE FIELD-EMISSION PROPERTY OF AMORPHOUS-CARBON NITRIDE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1219-1221

Authors: SONG SK CHO JS CHOI WK JUNG HJ CHOI DS LEE JY BAIK HK KOH SK
Citation: Sk. Song et al., STRUCTURE AND GAS-SENSING CHARACTERISTICS OF UNDOPED TIN OXIDE THIN-FILMS FABRICATED BY ION-ASSISTED DEPOSITION, Sensors and actuators. B, Chemical, 46(1), 1998, pp. 42-49

Authors: KWAK JS LEE JL BAIK HK
Citation: Js. Kwak et al., IMPROVED UNIFORMITY OF CONTACT RESISTANCE IN GAAS-MESFET USING PD GE/TI/AU OHMIC CONTACTS/, IEEE electron device letters, 19(12), 1998, pp. 481-483

Authors: CHOI DJ KIM YH HAN DW BAIK HK KIM SI
Citation: Dj. Choi et al., FORMATION OF POLYCRYSTALLINE SILICON FILMS ON GLASS SUBSTRATES AT LOW-TEMPERATURES BY A DIRECT NEGATIVE SI ION-BEAM DEPOSITION SYSTEM, Journal of crystal growth, 191(4), 1998, pp. 718-722

Authors: KIM CY KIM SW HONG CH KIM DW BAIK HK WHANG CN
Citation: Cy. Kim et al., EFFECTS OF TITANIUM SILICIDE ON AUSITI N-GAN OHMIC CONTACT SYSTEMS/, Journal of crystal growth, 190, 1998, pp. 720-724

Authors: YOON DS BAIK HK LEE SM
Citation: Ds. Yoon et al., TANTALUM-MICROCRYSTALLINE CEO2 DIFFUSION BARRIER FOR COPPER METALLIZATION, Journal of applied physics, 83(3), 1998, pp. 1333-1336

Authors: YOON DS BAIK HK LEE SM
Citation: Ds. Yoon et al., EFFECT ON THERMAL-STABILITY OF A CU TA/SI HETEROSTRUCTURE OF THE INCORPORATION OF CERIUM OXIDE INTO THE TA BARRIER/, Journal of applied physics, 83(12), 1998, pp. 8074-8076

Authors: YOON DS BAIK HK LEE SM PARK CS LEE SI
Citation: Ds. Yoon et al., OXIDATION RESISTANCE OF TANTALUM-RUTHENIUM DIOXIDE DIFFUSION BARRIER FOR MEMORY CAPACITOR BOTTOM ELECTRODES, Applied physics letters, 73(3), 1998, pp. 324-326

Authors: KWAK JS BAIK HK KIM JH LEE SM
Citation: Js. Kwak et al., IMPROVEMENT OF TA DIFFUSION BARRIER PERFORMANCE IN CU METALLIZATION BY INSERTION OF A THIN ZR LAYER INTO TA FILM, Applied physics letters, 72(22), 1998, pp. 2832-2834

Authors: SONG SK CHOI WK CHO JS JUNG HJ CHOI D LEE JY BAIK HK KOH SK
Citation: Sk. Song et al., EFFECT OF OXYGEN-ION ENERGY AND ANNEALING IN FORMATION OF TIN OXIDE THIN-FILMS, JPN J A P 1, 36(4A), 1997, pp. 2281-2287

Authors: RHO SJ SHIM JY CHI EJ BAIK HK LEE SM
Citation: Sj. Rho et al., THE FIELD-EMISSION CHARACTERISTICS OF A-C-H THIN-FILMS PREPARED BY HELICAL RESONATOR PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, JPN J A P 2, 36(8A), 1997, pp. 1051-1054

Authors: SONG SK CHOI WK JUNG HJ BAIK HK KOH SK
Citation: Sk. Song et al., COMPARISON OF PROPERTIES OF TIN OXIDE-FILMS DEPOSITED BY REACTIVE-PARTIALLY IONIZED BEAM, ION-ASSISTED, AND HYBRID ION-BEAM METHODS, Nanostructured materials, 8(4), 1997, pp. 477-488

Authors: YOON DS BAIK HK LEE SM
Citation: Ds. Yoon et al., MICROCRYSTALLINE OXIDE-INCORPORATED NEW DIFFUSION BARRIER FOR DYNAMICRANDOM-ACCESS MEMORY AND FERROELECTRIC RANDOM-ACCESS MEMORY CAPACITORELECTRODE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2781-2786

Authors: PARK SW KIM YI KWAK JS BAIK HK
Citation: Sw. Park et al., INVESTIGATION OF CO SIC INTERFACE REACTION, Journal of electronic materials, 26(3), 1997, pp. 172-177

Authors: KIM DW KWAK JS PARK HS KIM HN BAIK HK LEE SM KIM CS NOH SK
Citation: Dw. Kim et al., INTERFACIAL REACTION AND ELECTRICAL PROPERTY OF GE NI/ZNSE FOR BLUE LASER-DIODE/, Journal of electronic materials, 26(2), 1997, pp. 83-89

Authors: SHIM JY PARK SW BAIK HK
Citation: Jy. Shim et al., SILICIDE FORMATION IN COBALT AMORPHOUS-SILICON, AMORPHOUS CO-SI AND BIAS-INDUCED CO-SI FILMS, Thin solid films, 292(1-2), 1997, pp. 31-39

Authors: KIM JH BAIK HK
Citation: Jh. Kim et Hk. Baik, STRUCTURAL AND OPTICAL-PROPERTIES OF AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Solid state communications, 104(11), 1997, pp. 653-656

Authors: JUNG HN KIM MH KIM KN BAIK HK
Citation: Hn. Jung et al., THE EFFECTS OF ZR ADDITION ON MECHANICAL-PROPERTIES AND MICROSTRUCTURE OF AG-PD ALLOY, Journal of dental research, 76, 1997, pp. 531-531

Authors: KIM GB KWAK JS BAIK HK LEE SM
Citation: Gb. Kim et al., INTERFACIAL REACTION AND FORMATION MECHANISM OF EPITAXIAL COSI2 BY RAPID THERMAL ANNEALING IN CO TI/SI(100) SYSTEM/, Journal of applied physics, 82(5), 1997, pp. 2323-2328

Authors: KIM JH AHN DH KIM YH BAIK HK
Citation: Jh. Kim et al., CHARACTERIZATION OF AMORPHOUS HYDROGENATED CARBON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING A HELICAL RESONATOR DISCHARGE, Journal of applied physics, 82(2), 1997, pp. 658-665

Authors: LEE JL KIM YT KWAK JS BAIK HK UEDONO A TANIGAWA S
Citation: Jl. Lee et al., EVIDENCE FOR THE FORMATION OF N(-GAAS LAYER IN PD())GE OHMIC CONTACT TO N-TYPE GAAS/, Journal of applied physics, 82(11), 1997, pp. 5460-5464

Authors: KANG BS LEE SM KWAK JS YOON DS BAIK HK
Citation: Bs. Kang et al., THE EFFECTIVENESS OF TA PREPARED BY ION-ASSISTED DEPOSITION AS A DIFFUSION BARRIER BETWEEN COPPER AND SILICON, Journal of the Electrochemical Society, 144(5), 1997, pp. 1807-1812

Authors: SONG SK JUNG HJ KOH SK BAIK HK
Citation: Sk. Song et al., MODELING OF ELECTRICAL CONDUCTANCE VARIATION IN SUBSTRATE DURING INITIAL GROWTH OF ULTRA-THIN FILM, Applied physics letters, 71(6), 1997, pp. 850-851
Risultati: 1-25 | 26-45