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Results: 1-20 |
Results: 20
EFFECT OF ADDITIVE GASES ON DIMENSION CONTROL DURING CL-2-BASED POLYSILICON GATE ETCHING
Authors: LEE HS JUN BJ LEE DD BAIK KH SEOL YS
Citation: Hs. Lee et al., EFFECT OF ADDITIVE GASES ON DIMENSION CONTROL DURING CL-2-BASED POLYSILICON GATE ETCHING, JPN J A P 1, 37(7), 1998, pp. 3889-3893
TIN ETCHING AND ITS EFFECTS ON TUNGSTEN ETCHING IN SF6 AR HELICON PLASMA/
Authors: CHOI CJ SEOL YS BAIK KH
Citation: Cj. Choi et al., TIN ETCHING AND ITS EFFECTS ON TUNGSTEN ETCHING IN SF6 AR HELICON PLASMA/, JPN J A P 1, 37(3A), 1998, pp. 801-806
ANALYSIS OF HORIZONTAL-VERTICAL PATTERNING ASYMMETRY IN A LINEARLY POLARIZED DEEP UV EXPOSURE SYSTEM
Authors: LIM CM KIM HS BAIK KH
Citation: Cm. Lim et al., ANALYSIS OF HORIZONTAL-VERTICAL PATTERNING ASYMMETRY IN A LINEARLY POLARIZED DEEP UV EXPOSURE SYSTEM, JPN J A P 1, 37(1), 1998, pp. 364-368
DIFFERENT CARBIDE TYPES AND THEIR EFFECT ON BEND PROPERTIES OF A SPRAY-FORMED HIGH-SPEED STEEL
Authors: LEE ES PARK WJ BAIK KH AHN S
Citation: Es. Lee et al., DIFFERENT CARBIDE TYPES AND THEIR EFFECT ON BEND PROPERTIES OF A SPRAY-FORMED HIGH-SPEED STEEL, Scripta materialia, 39(8), 1998, pp. 1133-1138
KOREAN ROAD MAP FOR MICROPATTERNING INTO THE NEXT CENTURY
Authors: BAIK KH
Citation: Kh. Baik, KOREAN ROAD MAP FOR MICROPATTERNING INTO THE NEXT CENTURY, Microelectronic engineering, 35(1-4), 1997, pp. 11-20
DEVELOPMENT OF MICROSTRUCTURE IN SPRAY FORMED ALLOYS
Authors: CANTOR B BAIK KH GRANT PS
Citation: B. Cantor et al., DEVELOPMENT OF MICROSTRUCTURE IN SPRAY FORMED ALLOYS, Progress in Materials Science, 42(1-4), 1997, pp. 373-392
MECHANISM OF TUNGSTEN ATOM FORMATION IN TUNGSTEN ETCHBACK USING SF6 AR HELICON PLASMA/
Authors: CHOI CJ SEOL YS KWON OS BAIK KH
Citation: Cj. Choi et al., MECHANISM OF TUNGSTEN ATOM FORMATION IN TUNGSTEN ETCHBACK USING SF6 AR HELICON PLASMA/, Journal of the Electrochemical Society, 144(7), 1997, pp. 2442-2447
EFFECT OF FLUOROCARBON POLYMER BUILDUP AN ETCHING IN O-2 AR AND CF4/CHF3/AR PLASMA/
Authors: LEE DD LEE HS KIM SW BAIK KH
Citation: Dd. Lee et al., EFFECT OF FLUOROCARBON POLYMER BUILDUP AN ETCHING IN O-2 AR AND CF4/CHF3/AR PLASMA/, Journal of the Electrochemical Society, 144(5), 1997, pp. 1774-1776
STUDY ON ELLIPTIC POLARIZATION ILLUMINATION EFFECTS FOR MICROLITHOGRAPHY
Authors: JEON SH CHO BD LEE KW LEE SM BAIK KH AHN CN YIM DG
Citation: Sh. Jeon et al., STUDY ON ELLIPTIC POLARIZATION ILLUMINATION EFFECTS FOR MICROLITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4193-4198
HORIZONTAL MERGERS OF PRICE-SETTING FIRMS WITH SUNK CAPACITY COSTS
Authors: BAIK KH
Citation: Kh. Baik, HORIZONTAL MERGERS OF PRICE-SETTING FIRMS WITH SUNK CAPACITY COSTS, The Quarterly review of economics and finance, 35(3), 1995, pp. 245-256
COMPETITIVE-SHARE GROUP FORMATION IN RENT-SEEKING CONTEST
Authors: BAIK KH SHOGREN JF
Citation: Kh. Baik et Jf. Shogren, COMPETITIVE-SHARE GROUP FORMATION IN RENT-SEEKING CONTEST, Public choice, 83(1-2), 1995, pp. 113-126
EXTENDING THE LIMITS OF OPTICAL LITHOGRAPHY FOR ARBITRARY MASK LAYOUTS USING ATTENUATED PHASE-SHIFTING MASKS WITH OPTIMIZED ILLUMINATION
Authors: RONSE K PFORR R BAIK KH JONCKHEERE R VANDENHOVE L
Citation: K. Ronse et al., EXTENDING THE LIMITS OF OPTICAL LITHOGRAPHY FOR ARBITRARY MASK LAYOUTS USING ATTENUATED PHASE-SHIFTING MASKS WITH OPTIMIZED ILLUMINATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3783-3792
QUARTER-MICRON LITHOGRAPHY WITH A WET-SILYLATED AND DRY-DEVELOPED COMMERCIAL PHOTORESIST
Authors: GOGOLIDES E TZEVELEKIS D TSOI E HATZAKIS M GOETHALS AM BAIK KH VANROEY F
Citation: E. Gogolides et al., QUARTER-MICRON LITHOGRAPHY WITH A WET-SILYLATED AND DRY-DEVELOPED COMMERCIAL PHOTORESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3914-3918
INTERFACE AND TENSILE BEHAVIOR OF SQUEEZE CAST AC8A-AL2O3 COMPOSITE
Authors: BAIK KH LEE GC AHN S
Citation: Kh. Baik et al., INTERFACE AND TENSILE BEHAVIOR OF SQUEEZE CAST AC8A-AL2O3 COMPOSITE, Scripta metallurgica et materialia, 30(2), 1994, pp. 235-239
ATTENUATED PHASE-SHIFTING MASKS IN COMBINATION WITH OFF-AXIS ILLUMINATION - A WAY TOWARDS QUARTER MICRON DUV LITHOGRAPHY FOR RANDOM LOGIC APPLICATIONS
Authors: RONSE K PFORR R BAIK KH JONCKHEERE R VANDENHOVE L
Citation: K. Ronse et al., ATTENUATED PHASE-SHIFTING MASKS IN COMBINATION WITH OFF-AXIS ILLUMINATION - A WAY TOWARDS QUARTER MICRON DUV LITHOGRAPHY FOR RANDOM LOGIC APPLICATIONS, Microelectronic engineering, 23(1-4), 1994, pp. 133-138
LITHOGRAPHIC EVALUATION OF A NEW WET SILYLATION PROCESS USING SAFE SOLVENTS AND THE COMMERCIAL PHOTORESIST AZ 5214E(TM)
Authors: GOGOLIDES E BAIK KH YANNAKOPOULOU K VANDENHOVE L HATZAKIS M
Citation: E. Gogolides et al., LITHOGRAPHIC EVALUATION OF A NEW WET SILYLATION PROCESS USING SAFE SOLVENTS AND THE COMMERCIAL PHOTORESIST AZ 5214E(TM), Microelectronic engineering, 23(1-4), 1994, pp. 267-270
ENVIRONMENTAL CONFLICTS WITH REIMBURSEMENT FOR CITIZEN SUITS
Authors: BAIK KH SHOGREN JF
Citation: Kh. Baik et Jf. Shogren, ENVIRONMENTAL CONFLICTS WITH REIMBURSEMENT FOR CITIZEN SUITS, Journal of environmental economics and management, 27(1), 1994, pp. 1-20
EFFORT LEVELS IN CONTESTS WITH 2 ASYMMETRIC PLAYERS
Authors: BAIK KH
Citation: Kh. Baik, EFFORT LEVELS IN CONTESTS WITH 2 ASYMMETRIC PLAYERS, Southern economic journal, 61(2), 1994, pp. 367-379
STABILITY OF SILYLATED IMAGES FOR APPLICATION TO DRY DEVELOPABLE DEEP-UV LITHOGRAPHY
Authors: GOETHALS AM BAIK KH RONSE K VANDENHOVE L ROLAND B
Citation: Am. Goethals et al., STABILITY OF SILYLATED IMAGES FOR APPLICATION TO DRY DEVELOPABLE DEEP-UV LITHOGRAPHY, Microelectronic engineering, 21(1-4), 1993, pp. 239-244
EFFORT LEVELS IN CONTESTS - THE PUBLIC-GOOD PRIZE CASE
Authors: BAIK KH
Citation: Kh. Baik, EFFORT LEVELS IN CONTESTS - THE PUBLIC-GOOD PRIZE CASE, Economics letters, 41(4), 1993, pp. 363-367
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