Authors:
MARCADAL C
RICHARD E
MERMET JL
TORRES J
PALLEAU J
ALAUX B
BAKLI M
Citation: C. Marcadal et al., CU-CVD PROCESS OPTIMIZED IN A CLUSTER EQUIPMENT FOR IC MANUFACTURING, Microelectronic engineering, 33(1-4), 1997, pp. 3-13
Authors:
ULMER L
GEORGES L
VELER JC
MORAND Y
BAKLI M
FERRIER V
LERME M
PERROUD L
MOREL T
Citation: L. Ulmer et al., EFFECT OF TUNGSTEN CHEMICAL-VAPOR-DEPOSITION NUCLEATION STEP ON VIA PERFORMANCE, Microelectronic engineering, 33(1-4), 1997, pp. 121-127